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Chemical Properties Of Hexamethyldisiloxane

Update:2020-08-18 10:46
Summary:

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly used as a source of plasma-enhanced chemical vapor deposition (PE-CVD) of silicon compound films. In silicon integrated circuit technology, it is also used as a substitute for silane. Fourier transform mass spectrometry was used to study the dissociation and ionization caused by electron impact. The synthesis of plasma polymerized HMDSO films by atmospheric pressure glow discharge (APG) has been reported. The 148K HMDSO crystal is a monoclinic crystal. Adding HMDSO to P4S10 can improve its efficiency as a desulfurizer

 

 

Hexamethyldisiloxane    can be used to produce a gas diffusion layer (GDL) with controlled hydrophobicity of silicone nano-layers through a "dry" deposition process

 

 

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